Electron Beam Lithography Systems

Over 40 years of nanotechnology expertise
Since the founding of our company in 1975 we have driven advances in nanotechnology through our contributions to the fields of fine patterning and measurement and analysis. Elionix collaborates with global research and development efforts in SEM imaging as well as the fabrication of a variety of nanoscale devices. For over 40 years we have assisted in the development of silicon based devices as well as more exotic materials. Our unique approach and application-specific solutions allows our customers to meet future market challenges.
image

ELS Series

As the global leader in this technology we provide a selection of optimized systems, including the world's most advanced ultra high precision models.

-ELS Series-

ELS-F150
image
150kV Acceleration Voltage EB Lithography
ELS-F125
image
125kV Acceleration Voltage EB Lithography
ELS-F100
image
100kV Acceleration Voltage EB Lithography
ELS-HS50
image
High Throughput 50kV  Acceleration Voltage EB Lithography
PAGETOP