Applications

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Electron Beam Lithography System ELS Series

Acceleration Voltage 150 kV 

Line & Space pattern with 50 nm 
pitch and 3 nm line width

Elbow pattern with 12 nm pitch

Vertical, horizontal, diagonal, and ring patterns of 8 nm line 

Bow-Tie pattern with 2.5 nm gap 

Acceleration Voltage 125 kV 

Line & Space pattern with 60 nm 
pitch and 4 nm line

Blazed pattern with a pitch of 
600 nm 

SAW device pattern with 300 nm pitch 

Triangle pattern of 50 nm per 
side

Acceleration Voltage 100 kV 

Line & Space pattern with 50 nm
pitch and 3 nm line

Line & Space patterns with 60 nm pitch

Square patterns with a pitch of 400 nm

Ring pattern with 50 nm line

Acceleration Voltage 50 kV 

400 nm pitch Line & Space patterns on the entire surface of 4 inch wafer fabricated for 18 h

Concentric circle patterns with line 
widths 100-450 nm

Patterns imitating scales of 
morpho butterflies

Rectangular pattern with 
150 nm line