University of Illinois at Urbana-Champaign Holonyak Micro & Nanotechnology Lab
Holonyak Micro & Nanotechnology Lab
Dr. Edmond Chow
Senior Research Engineer
At the University of Illinois, the Elionix electron beam lithography system delivers outstanding plotting performance. It also features intuitive, user-friendly software that allows even new users to master the system quickly.
"The system provides outstanding lithography resolution and overlay accuracy. Additionally, its software is intuitive and user-friendly, enabling new student users to quickly become proficient."
User Profile
- Over a quarter-century of extensive experience in the field of electron beam lithography
- Research in academia (University of Illinois, Chalmers University of Technology in Sweden)
- Research at national laboratories (Sandia National Laboratories)
- Research at private research laboratories (Agilent Technology Laboratory)
- A leading specialist in electron beam lithography and semiconductor microfabrication
Examples of patterning provided
10-nm line-and-space pattern, 55-nm CSAR resist mask
Three-layer resist (MMA-PMGI-PMMA)
100-nm T-gate for HEMT
