Electron Beam Lithography System
ELS-ORCA
Electron Beam Lithography System
ELS-ORCA
- New Products
- Microfabrication equipment
Key Features
Customize to Your Ideal Specifications with a Wide Range of Options
With a standard acceleration voltage of 30 kV, we offer a variety of options, including a 50 kV acceleration voltage, dynamic focus and stigmas, and focus adjustment using a height sensor. By combining these options, you can customize the system specifications to match your desired patterns and budget.
User-friendly software
The new device control software, “elms,” is now included as standard. By organizing and separating various functions—such as CAD conversion, beam adjustment, drawing execution, and SEM observation—we have made it easier to locate the features you need, significantly improving usability. The software also includes account management features, allowing you to restrict access based on user levels.
Retarding Option Designed Specifically for SEM Observation
A retarding option is available that enables low-damage, high-resolution SEM observation. This option allows for SEM observation at low acceleration voltages comparable to those of a standard SEM system, supporting sample sizes up to 8 inches and an observation field of view of 6 inches. Additionally, it supports automated observation by aligning coordinates using existing CAD drawings.
Key Specifications
| Electron gun | ZrO/W Thermionic Emission Type | |
|---|---|---|
| Acceleration voltage | 1 ~ 30 kV | 1 ~ 50 kV ※Options |
| Minimum Beam Diameter | D 2.0 nm | D 1.6 nm |
| Beam current | 5 pA ～ 80 nA | |
| Scan Clock | 100 MHz | |
| Shot Pitch | Minimum 0.1 nm | |
| Maximum Field Size | 1000 µm□ | |
| Maximum Sample Size | 8″ Wafer | |
| Maximum Drawing Area | 150 mm x 150 mm | |
| Conveying Mechanism | Single-Station Auto Loader | |
| Software | elms（Elms）
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Applications
Acceleration voltage 30 kV
