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Electron Beam Lithography System
ELS-BODEN

Electron Beam Lithography System

ELS-BODEN

  • New Products
  • Microfabrication equipment
Supports a wide range of applications, from high-resolution drawing to high-current, high-speed drawing
Electron Beam Lithography System ELS-BODEN
Electron Beam Lithography System ELS-BODEN
Electron Beam Lithography System ELS-BODEN
 

Key Features

8-inch and 12-inch models available

We have achieved the industry's first full 12-inch drawing area. The system supports wafers ranging from the small sizes commonly used in R&D to 2-, 3-, 4-, 5-, 6-, 7-, 8-, and 12-inch sizes, and is also compatible with 6025 and 9025 mask blanks.

A Comprehensive Lineup of Automatic Handling Systems

From single auto-loaders—which are in high demand for research and development applications—to multi-auto-loaders and robot loaders capable of handling everything from small-scale to medium-scale production, we offer a comprehensive lineup from which you can select the handling system that best suits your needs.

User-Friendly Software

The new device control software, “elms,” is now included as standard. By organizing and separating various functions—such as CAD conversion, beam adjustment, drawing execution, and SEM observation—we’ve made it easier to find the features you need, significantly improving usability. The software also includes account management features, allowing you to restrict access based on user levels.

Key Specifications

Electron gun ZrO/W Thermionic Emission Type
Acceleration voltage 50 kV 100 kV 125 kV 150 kV
Beam current 1 nA ～ 800 nA 20 pA ～ 200 nA 5 pA ～ 100 nA 5 pA ～ 100 nA
Minimum Beam Diameter D 2.8 nm D 1.8 nm D 1.7 nm D 1.5 nm
Standard Field Size 1000 μm□ 1000 μm□ 500 μm□ 500 μm□
Minimum / Maximum Field Size Minimum 100 μm□
Maximum（Options）3000 μm□
Scan Clock Standard 100 MHz
Maximum（Options）200MHz
Shot Pitch Minimum 0.2 nm
Maximum Sample Size 8″ Wafer / 12″ Wafer
Maximum Drawing Area 200 mm x 200 mm / 300 mm x 300 mm
Conveying Mechanism Single-Station Auto Loader
Multi-Station Auto Loader
Robotic Loader
Software elms（Elms）
  • Beam Adjustment Function
  • Plotting Schedule Function
  • Pattern Data Conversion Function
  • Account Management Function
  • Python Scripting

Applications

Applications

Acceleration voltage 150 kV

Line-and-space pattern with a pitch of 50 nm and a line width of 3 nm
Line-and-space pattern with a pitch of 50 nm and a line width of 3 nm
Elbow Pattern with a 12 nm Pitch
Elbow Pattern with a 12 nm Pitch
Vertical, horizontal, diagonal, and ring patterns with a line width of 8 nm
Vertical, horizontal, diagonal, and ring patterns with a line width of 8 nm
Bow-Tie Pattern with a 2.5 nm Gap
Bow-Tie Pattern with a 2.5 nm Gap

Acceleration voltage 125 kV

Line-and-space pattern with a pitch of 60 nm and a line width of 4 nm
Line-and-space pattern with a pitch of 60 nm and a line width of 4 nm
Blazed pattern with a pitch of 600 nm
Blazed pattern with a pitch of 600 nm
SAW device pattern with a pitch of 250 nm fabricated using a 2 µm-thick resist
SAW device pattern with a pitch of 250 nm fabricated using a 2 µm-thick resist
A triangular pattern with sides of 50 nm
A triangular pattern with sides of 50 nm

Acceleration voltage 100 kV

Pillar pattern with a diameter of 20 nm and a height of 60 nm
Pillar pattern with a diameter of 20 nm and a height of 60 nm
Line-and-space pattern with a pitch of 60 nm
Line-and-space pattern with a pitch of 60 nm
A square pattern with a pitch of 400 nm and a side length of 200 nm
A square pattern with a pitch of 400 nm and a side length of 200 nm
Ring Pattern with a Line Width of 50 nm Using Circumferential Scanning
Ring Pattern with a Line Width of 50 nm Using Circumferential Scanning

Acceleration voltage 50 kV

Fabrication of a 4-inch-wide line-and-space pattern with a pitch of 400 nm in 18 hours
Fabrication of a 4-inch-wide line-and-space pattern with a pitch of 400 nm in 18 hours
Concentric circle patterns with line widths ranging from 100 to 450 nm
Concentric circle patterns with line widths ranging from 100 to 450 nm
A pattern modeled after the scales of a morpho butterfly
A pattern modeled after the scales of a morpho butterfly
Rectangular pattern with a line width of 150 nm
Rectangular pattern with a line width of 150 nm

Contact Us

Feel free to get in touch. Our experts are happy to assist and answer your questions.