Measurement and Analysis Equipments

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ESC-101
A combination hollow anode ion gun and magnetron ion gun allow the ESC-101 to produce thin films with small particle sizes for SEM observation up to ×700,000 magnification.

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Key Product Features

Conductive coatings with less than 1 nm surface roughness

- Ar ion beam sputtering
- Enables ×700,000 magnification SEM imaging due to small (0.2 – 0.5 nm) particle sizes
- Short deposition time (actual deposition time is 3 – 5 minutes at 1 Pa)
- Good feature coverage and adhesion among narrow features, coatings are contamination resistant
- Various target materials available upon request (Standard target is tungsten)

Application Gallery

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    Selected Area Electron Diffraction (SAED) image from a TEM showing tungsten film’s amorphous structure

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    15 nm thick tungsten film at ×1,000,000 magnification

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Specification

Ion Gun Acceleration Voltage 200 V
Target Acceleration Voltage 1.4 kV
Operation Current
20 mA
Operation Vacuum 1 Pa
Target Size 50 mm × 50 mm
Specimen Size Ø 25 × 15 mm
Up to Ø 50 × 15 mm (option)
PAGETOP