Measurement and Analysis Equipments

image

ESC-101
Thanks to combination of hollow anode ion gun and magnetron ion gun, ESC-101 produces thin and fine metal deposition with high uniformity to enable x700,00 magnifiacation observation in SEM

  • image

  • image

Product key feature

Coating Conductive Material Layer with Less Than 1nm Surface Roughness

- Ion Beam Sputtering using Ar ion
- Enable x700,000 magnification SEM imaging due to deposited conductive layer of 0.2 to 0.5nm particle sizes on sample  
- Short time deposition (actual deposition time is 3 to 5 mins at 1Pa vacuum atomosphere)
- Various target materials are possible on your request in option.(Standard target is tungsten)

Application Gallery

  • image

  • image

image

Specification

Ion Gun Acceleration Voltage 200 V
Target Acceleration Voltage 1.4 kV
Operation Current
20 mA
Operation Vacuum 1 Pa
Target Size 50mm Squared
Specimen Size Inside Φ32 x h15 mm
PAGETOP