Application

ELS-F125
製品情報はこちら

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    equilateral triangles with sharp corners

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    600 um field exposure
    Uniform fine lines were written on entire field.

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    9nm fine line (Pitch50nm) with 1nA beam current 

ELS-F100
製品情報はこちら

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    T-gate process with three layers of resist

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    DotPitch 600nm
    Height 2um

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    5nm lines

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    Proximity effect comparison between 100kV and 30kV

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    85nm Rings
    (Pitch 200nm)

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    3D hologram

ERA-9000
製品情報はこちら

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    EB resist
    (x200,000)

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    Carbon nano tube
    (x100,000)

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    Carbon nano tube
    tip (x400,000)

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    Gold particle comparison with different accelaration voltages (x200,000)

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    SEM image with enhanced topography (A-B)

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    3D bird's eye view

PAGETOP