Home > ESC-101
High-Resolution SEM Sample Coating System
ESC-101
By combining a hollow anode ion source and magnetron ion source,
our own designed new ion gun creates ultra-fine structured films.
Features
Coating with tungsten and other ultra-fine particles with diameters of 1 nm and less are easily performed.
Granulation is not observed even under 700,000x magnification by a SEM, making the system suitable for high magnification observation. (The particle size of the tungsten film deposited by Ar ion beam sputtering is 0.2 to 0.5 nm.)
Quick coating with minimal thermal damage is attained with the sample surface temperature of 50℃ and lower.
3 to 5 minutes after the 1-Pa vacuum is reached.
Even and highly adhesive coating covers the narrowest profiles, obtaining coating that is less prone to contamination.
In addition to the standard tungsten target, other target materials are available upon request.
*Etching is optionally available.
Specifications
| Specimen size | 32 φ × t15 mm (maximum) |
| Target size | 50mm |
| Operating vacuum | 1Pa |
| Operating current | 20mA |
| Voltage applied to the ion gun | 200V |
| Voltage applied to the target | 1.4kV |
| Power supply requirement | 100 VAC, 9A |
| Dimensions | 400W×700D×900H |
Products
- Ultra-High Precision EB Electron Beam Lithography System
- Electron Beam 3D Surface Roughness Analyzer
- High-Resolution SEM Sample Coating System
